Hydrazine-based deposition route for device-quality CIGS films

Published

Conference Paper

A simple solution-based approach for depositing CIGS (Cu-In-Ga-Se/S) absorber layers is discussed, with an emphasis on film characterization, interfacial properties and integration into photovoltaic devices. The process involves incorporating all metal and chalcogenide components into a single hydrazine-based solution, spin coating a precursor film, and heat treating in an inert atmosphere, to form the desired CIGS film with up to micron-scaled film thickness and grain size. PV devices (glass/Mo/CIGS/CdS/i-ZnO/ITO) employing the spin-coated CIGS and using processing temperatures below 500 °C have yielded power conversion efficiencies of up to 10% (AM 1.5 illumination), without the need for a post-CIGS-deposition treatment in a gaseous Se source or a cyanide-based bath etch. Short-duration low-temperature (T < 200 °C) oxygen treatment of completed devices is shown to have a positive impact on the performance of initially underperforming cells, thereby enabling better performance in devices prepared at temperatures below 500 °C. © 2008 Elsevier B.V. All rights reserved.

Full Text

Duke Authors

Cited Authors

  • Mitzi, DB; Yuan, M; Liu, W; Kellock, AJ; Chey, SJ; Gignac, L; Schrott, AG

Published Date

  • February 2, 2009

Published In

Volume / Issue

  • 517 / 7

Start / End Page

  • 2158 - 2162

International Standard Serial Number (ISSN)

  • 0040-6090

Digital Object Identifier (DOI)

  • 10.1016/j.tsf.2008.10.079

Citation Source

  • Scopus