Galvanic corrosion induced degredation of tensile properties in micromachined polycrystalline silicon

Published

Journal Article

Immersion of polycrystalline silicon in hydrofluoric acid-based solutions is often utilized in microsystem fabrication to liberate mechanical structures. The authors demonstrate, using microfabricated tensile specimens, that such etching can cause a catastrophic reduction in tensile strength and elastic modulus in silicon galvanically coupled to a metallic layer, such as commonly used gold. Galvanically corroded silicon exhibits grain-boundary attack leading to intergranular fracture and/or generalized material removal. The severity of damage and corresponding losses in strength and modulus depend on etch duration and etch chemistry. In contrast, without a metallic layer, uncorroded silicon fails transgranularly and independent of etch duration or chemistry. © 2007 American Institute of Physics.

Full Text

Duke Authors

Cited Authors

  • Miller, DC; Boyce, BL; Gall, K; Stoldt, CR

Published Date

  • May 17, 2007

Published In

Volume / Issue

  • 90 / 19

International Standard Serial Number (ISSN)

  • 0003-6951

Digital Object Identifier (DOI)

  • 10.1063/1.2737370

Citation Source

  • Scopus