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Hybrid field-effect transistor based on a low-temperature melt-processed channel layer

Publication ,  Journal Article
Mitzi, DB; Dimitrakopoulos, CD; Rosner, J; Medeiros, DR; Xu, Z; Noyan, C
Published in: Advanced Materials
December 3, 2002

Hybrid field-effect…. Low-melting point hybrid perovskits have enabled the first demonstration of melt-processed field-effect transistors (FET) channel layers with both large saturation- and linear-regime mobilities. The ability to tailor the melting properties of the semiconducting systems using the organic component of the hybrid, enables a reduction of the melting temperature to values low enough for processing on selected plastic substrates with even lower melting temperatures envisioned as wider range of organic cations is explored. With respect to vapor-phase deposition, melt processing represents a lower-energy process and relaxes requirements for molecular mobility and reorganization on the substrate during deposition.

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Published In

Advanced Materials

DOI

ISSN

0935-9648

Publication Date

December 3, 2002

Volume

14

Issue

23

Start / End Page

1772 / 1776

Related Subject Headings

  • Nanoscience & Nanotechnology
  • 51 Physical sciences
  • 40 Engineering
  • 34 Chemical sciences
  • 09 Engineering
  • 03 Chemical Sciences
  • 02 Physical Sciences
 

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Mitzi, D. B., Dimitrakopoulos, C. D., Rosner, J., Medeiros, D. R., Xu, Z., & Noyan, C. (2002). Hybrid field-effect transistor based on a low-temperature melt-processed channel layer. Advanced Materials, 14(23), 1772–1776. https://doi.org/10.1002/1521-4095(20021203)14:23<1772::AID-ADMA1772>3.0.CO;2-Y
Mitzi, D. B., C. D. Dimitrakopoulos, J. Rosner, D. R. Medeiros, Z. Xu, and C. Noyan. “Hybrid field-effect transistor based on a low-temperature melt-processed channel layer.” Advanced Materials 14, no. 23 (December 3, 2002): 1772–76. https://doi.org/10.1002/1521-4095(20021203)14:23<1772::AID-ADMA1772>3.0.CO;2-Y.
Mitzi DB, Dimitrakopoulos CD, Rosner J, Medeiros DR, Xu Z, Noyan C. Hybrid field-effect transistor based on a low-temperature melt-processed channel layer. Advanced Materials. 2002 Dec 3;14(23):1772–6.
Mitzi, D. B., et al. “Hybrid field-effect transistor based on a low-temperature melt-processed channel layer.” Advanced Materials, vol. 14, no. 23, Dec. 2002, pp. 1772–76. Scopus, doi:10.1002/1521-4095(20021203)14:23<1772::AID-ADMA1772>3.0.CO;2-Y.
Mitzi DB, Dimitrakopoulos CD, Rosner J, Medeiros DR, Xu Z, Noyan C. Hybrid field-effect transistor based on a low-temperature melt-processed channel layer. Advanced Materials. 2002 Dec 3;14(23):1772–1776.
Journal cover image

Published In

Advanced Materials

DOI

ISSN

0935-9648

Publication Date

December 3, 2002

Volume

14

Issue

23

Start / End Page

1772 / 1776

Related Subject Headings

  • Nanoscience & Nanotechnology
  • 51 Physical sciences
  • 40 Engineering
  • 34 Chemical sciences
  • 09 Engineering
  • 03 Chemical Sciences
  • 02 Physical Sciences