Multispectral metasurface absorbers for optoelectronic devices

Conference Paper

© 2017 OSA. We demonstrate multispectral metasurfaces over wafer-scale areas exhibiting greater than 85 percent absorption, ~100 nm linewidths from 580-1125 nm by patterning plasmonic resonators in micron-scale pixels using a fusion of bottom-up and top-down fabrication techniques.

Full Text

Duke Authors

Cited Authors

  • Stewart, JW; Akselrod, GM; Smith, DR; Mikkelsen, MH

Published Date

  • January 1, 2017

Published In

  • Optics InfoBase Conference Papers

Volume / Issue

  • Part F41-CLEO_SI 2017 /

International Standard Book Number 13 (ISBN-13)

  • 9781943580279

Digital Object Identifier (DOI)

  • 10.1364/CLEO_SI.2017.SM3N.4

Citation Source

  • Scopus