PSP: An advanced surface-potential-based MOSFET model for circuit simulation
This paper describes the latest and most advanced surface-potential-based model jointly developed by The Pennsylvania State University and Philips. Specific topics include model structure, mobility and velocity saturation description, further development and verification of symmetric linearization method, recent advances in the computational techniques for the surface potential, modeling of gate tunneling current, inclusion of the retrograde impurity profile, and noise sources. The emphasis of this paper is on incorporating the recent advances in MOS device physics and modeling within the compact modeling context. © 2006 IEEE.
Gildenblat, G; Li, X; Wu, W; Wang, H; Jha, A; Van Langevelde, R; Smit, GDJ; Scholten, AJ; Klaassen, DBM
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