Bias assisted etching of diamond in a conventional chemical vapor deposition reactor
Publication
, Journal Article
Stoner, BR; Tessmer, GJ; Dreifus, DL
Published in: Applied Physics Letters
December 1, 1993
A novel technique for selectively etching diamond films is presented. This letter describes a technique by which diamond may be etched in a conventional plasma assisted chemical vapor deposition (CVD) reactor at rates comparable to those reported for both electron cyclotron resonance and reactive ion etching techniques. This technique involves negatively biasing the diamond film, while it is immersed in a mostly hydrogen containing plasma. Negative dc bias assisted etching of CVD diamond films is performed in both microwave and dc plasma reactors over a wide range of temperatures and pressures. Speculation on the etching mechanisms is also included.
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Published In
Applied Physics Letters
DOI
ISSN
0003-6951
Publication Date
December 1, 1993
Volume
62
Issue
15
Start / End Page
1803 / 1805
Related Subject Headings
- Applied Physics
- 51 Physical sciences
- 40 Engineering
- 10 Technology
- 09 Engineering
- 02 Physical Sciences
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Stoner, B. R., Tessmer, G. J., & Dreifus, D. L. (1993). Bias assisted etching of diamond in a conventional chemical vapor deposition reactor. Applied Physics Letters, 62(15), 1803–1805. https://doi.org/10.1063/1.109555
Stoner, B. R., G. J. Tessmer, and D. L. Dreifus. “Bias assisted etching of diamond in a conventional chemical vapor deposition reactor.” Applied Physics Letters 62, no. 15 (December 1, 1993): 1803–5. https://doi.org/10.1063/1.109555.
Stoner BR, Tessmer GJ, Dreifus DL. Bias assisted etching of diamond in a conventional chemical vapor deposition reactor. Applied Physics Letters. 1993 Dec 1;62(15):1803–5.
Stoner, B. R., et al. “Bias assisted etching of diamond in a conventional chemical vapor deposition reactor.” Applied Physics Letters, vol. 62, no. 15, Dec. 1993, pp. 1803–05. Scopus, doi:10.1063/1.109555.
Stoner BR, Tessmer GJ, Dreifus DL. Bias assisted etching of diamond in a conventional chemical vapor deposition reactor. Applied Physics Letters. 1993 Dec 1;62(15):1803–1805.
Published In
Applied Physics Letters
DOI
ISSN
0003-6951
Publication Date
December 1, 1993
Volume
62
Issue
15
Start / End Page
1803 / 1805
Related Subject Headings
- Applied Physics
- 51 Physical sciences
- 40 Engineering
- 10 Technology
- 09 Engineering
- 02 Physical Sciences