Creation of cadmium sulfide nanostructures using AFM dip-pen nanolithography.

Published

Journal Article

A dip-pen nanolithography (DPN) process capable of depositing nanoscaled structures of semiconducting CdS materials was developed by careful control of the reaction speed between the precursors. The new development expanded the scope of the powerful DPN process and provided more insight in the deposition mechanism. Features ranging from several hundreds of nanometers to sub-50 nanometers were generated and characterized. The effects of the surface property of the substrate, the relative humidity, the translating rate, and the temperature were systematically investigated. X-ray photoelectron spectroscopy (XPS) was used to verify the chemical composition of the patterns. In principle, this simple and convenient method should be applicable to deposit various metal sulfides on suitable substrates.

Full Text

Duke Authors

Cited Authors

  • Ding, L; Li, Y; Chu, H; Li, X; Liu, J

Published Date

  • December 2005

Published In

Volume / Issue

  • 109 / 47

Start / End Page

  • 22337 - 22340

PubMed ID

  • 16853909

Pubmed Central ID

  • 16853909

Electronic International Standard Serial Number (EISSN)

  • 1520-5207

International Standard Serial Number (ISSN)

  • 1520-6106

Digital Object Identifier (DOI)

  • 10.1021/jp053389r

Language

  • eng