Programmable self-aligning ferrofluid masks for lithographic applications

Journal Article

A novel self-aligned "soft masking" method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultra-fine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic fields applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV and/or chemical exposure.

Full Text

Duke Authors

Cited Authors

  • Yellen, BB; Friedman, G; Barbee, KA

Published Date

  • July 1, 2004

Published In

Volume / Issue

  • 40 / 4 II

Start / End Page

  • 2994 - 2996

International Standard Serial Number (ISSN)

  • 0018-9464

Digital Object Identifier (DOI)

  • 10.1109/TMAG.2004.829836

Citation Source

  • Scopus