Ferrofluid lithography


Journal Article

A novel self-aligned 'soft masking' method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultrafine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic field bias applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV or chemical exposure.

Full Text

Duke Authors

Cited Authors

  • Yellen, BB; Fridman, G; Friedman, G

Published Date

  • October 1, 2004

Published In

Volume / Issue

  • 15 / 10

International Standard Serial Number (ISSN)

  • 0957-4484

Digital Object Identifier (DOI)

  • 10.1088/0957-4484/15/10/011

Citation Source

  • Scopus