Surface-initiated polymerization on nanopatterns fabricated by electron-beam lithography


Journal Article

A new 'top-down/bottom-up' approach for fabricating patterned polymer-brush arrays on the micrometer and nanometer length scales was reported. It was suggested that patterns with well-defined feature dimensions, shapes, and inter-feature spacings can be easily created over large areas by lift-off electron beam lithography (EBL). The utility of combining lift-off EBL for fabrication of Au patterns and surface-initiated polymerization to form micro- and nanostructures of stimulus-responsive polymer brushes on silicon surfaces was demonstrated. The fabrication approach was found to allow a high level of lateral control in patterning surfaces with complex polymer-brush structures over large surface area.

Full Text

Duke Authors

Cited Authors

  • Ahn, SJ; Kaholek, M; Lee, WK; LaMattina, B; LaBean, TH; Zauscher, S

Published Date

  • December 27, 2004

Published In

Volume / Issue

  • 16 / 23-24

Start / End Page

  • 2141 - 2145

International Standard Serial Number (ISSN)

  • 0935-9648

Digital Object Identifier (DOI)

  • 10.1002/adma.200401055

Citation Source

  • Scopus