Ion-beam-induced atomic mixing

Journal Article (Journal Article)

Calculations based on the diffusion model are presented of atomic mixing by ion bombardment. This mixing is assumed to have its basis, as does sputtering, in the collision cascades generated by the primary beam. Sharp interfaces within a target are seen to be smoothed by ion bombardment. Mixing may place fundamental limits on the resolution of ion microprobes.

Full Text

Duke Authors

Cited Authors

  • Haff, PK; Switkowski, ZE

Published Date

  • December 1, 1977

Published In

Volume / Issue

  • 48 / 8

Start / End Page

  • 3383 - 3386

International Standard Serial Number (ISSN)

  • 0021-8979

Digital Object Identifier (DOI)

  • 10.1063/1.324179

Citation Source

  • Scopus