Correlation between Schottky barrier height and phase stoichiometry/structure of silicide-silicon interfaces

Summary form only given. The authors investigate to what extent the stoichiometry and microstructure of the bulk silicide affect the Schottky barrier height (SHB) at the interface by measuring the SHB of Ni and Pd silicide-Si interfaces focused on (100) and (111) substrates

Full Text

Duke Authors

Cited Authors

  • Schmid, PE; Ho, PS; Tan, TY

Published Date

  • 1982

Published In

  • J. Vac. Sci. Technol. (USA)

Volume / Issue

  • 20 / 3

Start / End Page

  • 688 - 689

Digital Object Identifier (DOI)

  • 10.1116/1.571629