EXAMINATION OF VACANCY AND SELF-INTERSTITIAL CONTRIBUTIONS TO SILICON SELF-DIFFUSION AND SWIRL DEFECT FORMATION.

Published

Journal Article

Duke Authors

Cited Authors

  • Tan, TY; Morehead, F; Gosele, U

Published Date

  • December 1, 1983

Published In

  • Proceedings the Electrochemical Society

Volume / Issue

  • 83-9 /

Start / End Page

  • 325 - 336

Citation Source

  • Scopus