Submicron mask alignment by coherent light sources

A method of fabricating integrated circuits is disclosed based on the use of interference or diffraction patterns produced by coherent light sources which can be used for accurate alignment of multi-level masks. The principle of this method consists of two steps: the production of the interference pattern and the recognition of the interference pattern

Duke Authors

Cited Authors

  • Ho, PS; Tan, TY

Published Date

  • 1980

Published In

  • IBM Tech. Discl. Bull. (USA)

Volume / Issue

  • 23 / 1

Start / End Page

  • 360 - 361