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Point defects and diffusion mechanisms pertinent to the Ga sublattice of GaAs

Publication ,  Journal Article
Tan, TY
Published in: Materials Chemistry & Physics
January 1, 1995

For the Ga sublattice of GaAs, the recent understanding of the impurity and self-diffusion mechanisms and the nature of the point defects responsible are discussed. Analyses of doping enhanced AlAs GaAs superlattice disordering data and impurity diffusion data have led to the conclusion that, under thermal equilibrium and intrinsic conditions, the triply-negatively-charged Ga vacancy ((VGa3-) governs Ga self-diffusion and AlGa interdiffusion in As-rich crystals, while the doubly-positively-charged Ga self-interstitial (IGa2+) dominates in Ga-rich crystals. When doped sufficiently, dominates in n-type crystals, while IGa2+ dominates in p-type crystals, irrespective of the crystal composition. The VGa3- species also contributes to the diffusion of the main donor species Si, while IGa2+ also governs the diffusion of the main acceptor species Zn and Be via the kick-out mechanism. The thermal equilibrium concentration of VGa3- (CVGa3-) has been found to exhibit a temperature independence or even a small negative temperature dependence in that, when the temperature is lowered, CVGa3-; is either unchanged or even slightly increases. This CVGa3- behavior is consistent with many outstanding experimental results. © 1995.

Duke Scholars

Published In

Materials Chemistry & Physics

DOI

ISSN

0254-0584

Publication Date

January 1, 1995

Volume

40

Issue

4

Start / End Page

245 / 252

Related Subject Headings

  • Materials
  • 4016 Materials engineering
  • 1007 Nanotechnology
  • 0912 Materials Engineering
  • 0303 Macromolecular and Materials Chemistry
 

Citation

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Tan, T. Y. (1995). Point defects and diffusion mechanisms pertinent to the Ga sublattice of GaAs. Materials Chemistry & Physics, 40(4), 245–252. https://doi.org/10.1016/0254-0584(95)01488-8
Tan, T. Y. “Point defects and diffusion mechanisms pertinent to the Ga sublattice of GaAs.” Materials Chemistry & Physics 40, no. 4 (January 1, 1995): 245–52. https://doi.org/10.1016/0254-0584(95)01488-8.
Tan TY. Point defects and diffusion mechanisms pertinent to the Ga sublattice of GaAs. Materials Chemistry & Physics. 1995 Jan 1;40(4):245–52.
Tan, T. Y. “Point defects and diffusion mechanisms pertinent to the Ga sublattice of GaAs.” Materials Chemistry & Physics, vol. 40, no. 4, Jan. 1995, pp. 245–52. Scopus, doi:10.1016/0254-0584(95)01488-8.
Tan TY. Point defects and diffusion mechanisms pertinent to the Ga sublattice of GaAs. Materials Chemistry & Physics. 1995 Jan 1;40(4):245–252.
Journal cover image

Published In

Materials Chemistry & Physics

DOI

ISSN

0254-0584

Publication Date

January 1, 1995

Volume

40

Issue

4

Start / End Page

245 / 252

Related Subject Headings

  • Materials
  • 4016 Materials engineering
  • 1007 Nanotechnology
  • 0912 Materials Engineering
  • 0303 Macromolecular and Materials Chemistry