TELLURIUM AND SELENIUM SELECTIVE ABSORBER THIN FILMS PRODUCED BY GAS-EVAPORATION METHODS.
Publication
, Journal Article
Cocks, FH; Peterson, MJ
Published in: Journal of vacuum science & technology
January 1, 1979
The production of Te and Se thin films by evaporation carried out under pressures of argon gas ranging from 1 atm to 0. 1 Torr has been investigated and the selective absorption characteristics of the resultant Te and Se films determined. Absorptivities (a) in excess of 97% have been found in Te films deposited in 1 Torr of argon. Absorptivities of gas evaporated Se films did not rise above 60%. Emissivities (e) of Se films were also high, over 20%. Emissivities of Te thin films were less than 10% in most instances. Maximum a/e values of 12:1 were obtained for Te films deposited at an argon pressure of 10 Torr.
Duke Scholars
Published In
Journal of vacuum science & technology
DOI
ISSN
0022-5355
Publication Date
January 1, 1979
Volume
16
Issue
5
Start / End Page
1560 / 1563
Citation
APA
Chicago
ICMJE
MLA
NLM
Cocks, F. H., & Peterson, M. J. (1979). TELLURIUM AND SELENIUM SELECTIVE ABSORBER THIN FILMS PRODUCED BY GAS-EVAPORATION METHODS. Journal of Vacuum Science & Technology, 16(5), 1560–1563. https://doi.org/10.1116/1.570248
Cocks, F. H., and M. J. Peterson. “TELLURIUM AND SELENIUM SELECTIVE ABSORBER THIN FILMS PRODUCED BY GAS-EVAPORATION METHODS.” Journal of Vacuum Science & Technology 16, no. 5 (January 1, 1979): 1560–63. https://doi.org/10.1116/1.570248.
Cocks FH, Peterson MJ. TELLURIUM AND SELENIUM SELECTIVE ABSORBER THIN FILMS PRODUCED BY GAS-EVAPORATION METHODS. Journal of vacuum science & technology. 1979 Jan 1;16(5):1560–3.
Cocks, F. H., and M. J. Peterson. “TELLURIUM AND SELENIUM SELECTIVE ABSORBER THIN FILMS PRODUCED BY GAS-EVAPORATION METHODS.” Journal of Vacuum Science & Technology, vol. 16, no. 5, Jan. 1979, pp. 1560–63. Scopus, doi:10.1116/1.570248.
Cocks FH, Peterson MJ. TELLURIUM AND SELENIUM SELECTIVE ABSORBER THIN FILMS PRODUCED BY GAS-EVAPORATION METHODS. Journal of vacuum science & technology. 1979 Jan 1;16(5):1560–1563.
Published In
Journal of vacuum science & technology
DOI
ISSN
0022-5355
Publication Date
January 1, 1979
Volume
16
Issue
5
Start / End Page
1560 / 1563