Magnetic field enhancement of amorphous silicon deposition rates
Publication
, Journal Article
Dimmey, LJ; Jones, PL; Cocks, FH
Published in: Thin Solid Films
April 1, 1980
Duke Scholars
Published In
Thin Solid Films
DOI
ISSN
0040-6090
Publication Date
April 1, 1980
Volume
67
Issue
1
Related Subject Headings
- Applied Physics
- 51 Physical sciences
- 40 Engineering
- 10 Technology
- 09 Engineering
- 02 Physical Sciences
Citation
APA
Chicago
ICMJE
MLA
NLM
Dimmey, L. J., Jones, P. L., & Cocks, F. H. (1980). Magnetic field enhancement of amorphous silicon deposition rates. Thin Solid Films, 67(1). https://doi.org/10.1016/0040-6090(80)90308-9
Dimmey, L. J., P. L. Jones, and F. H. Cocks. “Magnetic field enhancement of amorphous silicon deposition rates.” Thin Solid Films 67, no. 1 (April 1, 1980). https://doi.org/10.1016/0040-6090(80)90308-9.
Dimmey LJ, Jones PL, Cocks FH. Magnetic field enhancement of amorphous silicon deposition rates. Thin Solid Films. 1980 Apr 1;67(1).
Dimmey, L. J., et al. “Magnetic field enhancement of amorphous silicon deposition rates.” Thin Solid Films, vol. 67, no. 1, Apr. 1980. Scopus, doi:10.1016/0040-6090(80)90308-9.
Dimmey LJ, Jones PL, Cocks FH. Magnetic field enhancement of amorphous silicon deposition rates. Thin Solid Films. 1980 Apr 1;67(1).
Published In
Thin Solid Films
DOI
ISSN
0040-6090
Publication Date
April 1, 1980
Volume
67
Issue
1
Related Subject Headings
- Applied Physics
- 51 Physical sciences
- 40 Engineering
- 10 Technology
- 09 Engineering
- 02 Physical Sciences