Ultraflat nanosphere lithography: A new method to fabricate flat nanostructures


Journal Article

The ultraflat nanosphere lithography (UNSL) was demonstrated by developing the 150 nanometer features of gold, silver and aluminum. The metals were embedded in a matrix with topographical variations between patterned features and matrix. UNSL combined nanosphere lithography and ultraflat template stripping for the creation of ultraflat nanopatterned structures. The nanospheres were lifted off the surface by rinsing and sonication in a mixture of water and methanol. The results established UNSL as a useful technique for the fabrication of chemically distinct nanoarrays with minimal topographic variation.

Full Text

Duke Authors

Cited Authors

  • Frey, W; Woods, CK; Chilkoti, A

Published Date

  • October 16, 2000

Published In

Volume / Issue

  • 12 / 20

Start / End Page

  • 1515 - 1519

International Standard Serial Number (ISSN)

  • 0935-9648

Digital Object Identifier (DOI)

  • 10.1002/1521-4095(200010)12:20<1515::AID-ADMA1515>3.0.CO;2-J

Citation Source

  • Scopus