Wavelength Considerations for Improved Silicon Wafer Temperature Measurement by Ellipsometry

Journal Article (Journal Article)

The influence of the choice of wavelength on the resolution of silicon wafer temperature measurement by ellipsometry has been investigated. By changing the wavelength from 6328 to 4428 A, a 30% reduction was achieved in the rms difference between the temperature measured by ellipsometry and that measured by a thermocouple. Additional optical data are presented which provide insight into selecting the optimum wavelength for silicon wafer temperature measurement by ellipsometry. © 1994, The Electrochemical Society, Inc. All rights reserved.

Full Text

Duke Authors

Cited Authors

  • Sampson, RK; Conrad, KA; Massoud, HZ; Irene, EA

Published Date

  • January 1, 1994

Published In

Volume / Issue

  • 141 / 2

Start / End Page

  • 539 - 542

Electronic International Standard Serial Number (EISSN)

  • 1945-7111

International Standard Serial Number (ISSN)

  • 0013-4651

Digital Object Identifier (DOI)

  • 10.1149/1.2054762

Citation Source

  • Scopus