Challenges and opportunities for 157-nm mask technology

Published

Journal Article

Full Text

Duke Authors

Cited Authors

  • Mulkens, J; Wagner, C; Cummings, KD; George, RA

Published Date

  • December 30, 1999

Published In

  • 19th Annual Symposium on Photomask Technology

Published By

Digital Object Identifier (DOI)

  • 10.1117/12.373333