ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes

Published

Journal Article

Full Text

Duke Authors

Cited Authors

  • Mulkens, J; Stoeldraijer, JMD; Davies, G; Dierichs, M; Heskamp, B; Moers, MHP; George, RA; Roempp, O; Glatzel, H; Wagner, C; Pollers, I; Jaenen, P

Published Date

  • July 26, 1999

Published In

  • Optical Microlithography Xii

Published By

Digital Object Identifier (DOI)

  • 10.1117/12.354362