RTD/CMOS Nanoelectronic Circuits: Thin-Film InP-Based Resonant Tunneling Diodes Integrated with CMOS Circuits
The combination of resonant tunneling diodes (RTD's) and complementary metal-oxide-semiconductor (CMOS) silicon circuitry can offer substantial improvement in speed, power dissipation, and circuit complexity over CMOS-only circuits. We demonstrate the first integrated resonant tunneling CMOS circuit, a clocked 1-bit comparator with a device count of six, compared with 21 in a comparable all-CMOS design. A hybrid integration process is developed for InP-based RTD's which are transferred and bonded to CMOS chips. The prototype comparator shows sensitivity in excess of 106 V/A, and achieves error-free performance in functionality testing. An optimized integration process, under development, can yield high-speed, low power circuits by lowering the high parasitic capacitance associated with the prototype circuit.
Bergman, JI; Chang, J; Joo, Y; Matinpour, B; Laskar, J; Jokerst, NM; Brooke, MA; Brar, B; Beam, E
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