A Pixellated Grating Array Using Photoelectrochemical Etching on a GaAs Waveguide

Journal Article (Journal Article)

We have demonstrated and evaluated a grating array outcoupler fabricated by photoelectrochemical (PEC) etching, a manufacturable and practical approach for fabrication of grating-based III- V semiconductor waveguide devices. An array of submicron period gratings was etched into photolithographically delineated areas in a single PEC step. The fabricated devices are: 10-µm wide rib waveguides with 0.35-µm first-order outcoupling gratings; and 10-µm wide rib waveguides with 10 µm× 10 µm pixellated areas of gratings. Device characterization demonstrates the effectiveness of outcoupling grating fabrication using PEC and that the pixellated grating outcoupler is an effective and simple means of generating an optical beam array. © 1995 IEEE

Full Text

Duke Authors

Cited Authors

  • Twyford, EJ; Jokerst, NM; Kohl, PA; Tayag, TJ

Published Date

  • January 1, 1995

Published In

Volume / Issue

  • 7 / 7

Start / End Page

  • 766 - 768

Electronic International Standard Serial Number (EISSN)

  • 1941-0174

International Standard Serial Number (ISSN)

  • 1041-1135

Digital Object Identifier (DOI)

  • 10.1109/68.393199

Citation Source

  • Scopus