Analysis of GaAs substrate removal etching with citric acid:H2O2 and NH4OH:H2O2 for application to compliant substrates
Journal Article
Full Text
Duke Authors
Cited Authors
- CarterComan, C; BicknellTassius, R; Benz, RG; Brown, AS; Jokerst, NM
Published Date
- February 1997
Published In
Volume / Issue
- 144 / 2
Start / End Page
- L29 - L31
International Standard Serial Number (ISSN)
- 0013-4651
Digital Object Identifier (DOI)
- 10.1149/1.1837422