Analysis of GaAs substrate removal etching with citric acid:H2O2 and NH4OH:H2O2 for application to compliant substrates

Journal Article

Full Text

Duke Authors

Cited Authors

  • CarterComan, C; BicknellTassius, R; Benz, RG; Brown, AS; Jokerst, NM

Published Date

  • February 1997

Published In

Volume / Issue

  • 144 / 2

Start / End Page

  • L29 - L31

International Standard Serial Number (ISSN)

  • 0013-4651

Digital Object Identifier (DOI)

  • 10.1149/1.1837422