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Predict - A new design tool for shallow junction processes

Publication ,  Journal Article
Fair, RB; Subrahmanyan, R
Published in: Proceedings of SPIE - The International Society for Optical Engineering
April 9, 1985

A new one-dimensional.process estimator for the Resign of X£ technologies (PREDICT) has been developed which rigorously solves coupled equations describing dopant behavior under modern processing conditions. All of the models in PREDICT have been verified with extensive experimental measurements. Such models include a new ion implantation algorithm with empirical parameters to describe the exponential tail formed through ion channeling, rapid thermal diffusion of B, As and P, accurate oxidation calculations including the effects of pressure, HC1 and doping concentrations, effects of stress and dopant precipitation and clustering, ion pairing, implantation through deposited or grown films (oxide, polysilicon, nitride), concentration effects, etc. © 1985 SPIE.

Duke Scholars

Published In

Proceedings of SPIE - The International Society for Optical Engineering

DOI

EISSN

1996-756X

ISSN

0277-786X

Publication Date

April 9, 1985

Volume

530

Start / End Page

88 / 96

Related Subject Headings

  • 5102 Atomic, molecular and optical physics
  • 4009 Electronics, sensors and digital hardware
  • 4006 Communications engineering
 

Citation

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Fair, R. B., & Subrahmanyan, R. (1985). Predict - A new design tool for shallow junction processes. Proceedings of SPIE - The International Society for Optical Engineering, 530, 88–96. https://doi.org/10.1117/12.946472
Fair, R. B., and R. Subrahmanyan. “Predict - A new design tool for shallow junction processes.” Proceedings of SPIE - The International Society for Optical Engineering 530 (April 9, 1985): 88–96. https://doi.org/10.1117/12.946472.
Fair RB, Subrahmanyan R. Predict - A new design tool for shallow junction processes. Proceedings of SPIE - The International Society for Optical Engineering. 1985 Apr 9;530:88–96.
Fair, R. B., and R. Subrahmanyan. “Predict - A new design tool for shallow junction processes.” Proceedings of SPIE - The International Society for Optical Engineering, vol. 530, Apr. 1985, pp. 88–96. Scopus, doi:10.1117/12.946472.
Fair RB, Subrahmanyan R. Predict - A new design tool for shallow junction processes. Proceedings of SPIE - The International Society for Optical Engineering. 1985 Apr 9;530:88–96.

Published In

Proceedings of SPIE - The International Society for Optical Engineering

DOI

EISSN

1996-756X

ISSN

0277-786X

Publication Date

April 9, 1985

Volume

530

Start / End Page

88 / 96

Related Subject Headings

  • 5102 Atomic, molecular and optical physics
  • 4009 Electronics, sensors and digital hardware
  • 4006 Communications engineering