Relationships between the thermal stability, friction, and wear properties of reactively sputtered Si-aC:H thin films

Published

Journal Article

The friction and wear performance were correlated with the thermal stability of reactively sputtered Si-aC:H thin films containing various Si and H concentrations. The average steady-state friction coefficients as measured by dry sliding pin-on-disk tests decreased with increasing Si and H content. Furthermore, the films with high Si and H formed thick transfer films as compared to the films with little or no Si and H content. Minimums in average ball abrasion rate and average film wear rate were observed at the Si/C = 0.10 film composition. The most intense and distinct "graphitic" Raman peaks were collected from the Si/C = 0.10 transfer film debris. In addition, the Si/C = 0.10 film also had the most distinguishable graphitic Raman signature after annealing in air at 500°C compared to the other Si-aC:H films, suggesting a possible relationship between the nature of transfer films resulting from dry sliding in air and the bulk films that were annealed in air.

Full Text

Duke Authors

Cited Authors

  • Evans, RD; Doll, GL; Glass, JT

Published Date

  • January 1, 2002

Published In

Volume / Issue

  • 17 / 11

Start / End Page

  • 2888 - 2896

International Standard Serial Number (ISSN)

  • 0884-2914

Digital Object Identifier (DOI)

  • 10.1557/JMR.2002.0419

Citation Source

  • Scopus