Relationships between the thermal stability, friction, and wear properties of reactively sputtered Si-aC:H thin films

The friction and wear performance were correlated with the thermal stability of reactively sputtered Si-aC:H thin films containing various Si and H concentrations. The average steady-state friction coefficients as measured by dry sliding pin-on-disk tests decreased with increasing Si and H content. Furthermore, the films with high Si and H formed thick transfer films as compared to the films with little or no Si and H content. Minimums in average ball abrasion rate and average film wear rate were observed at the Si/C = 0.10 film composition. The most intense and distinct "graphitic" Raman peaks were collected from the Si/C = 0.10 transfer film debris. In addition, the Si/C = 0.10 film also had the most distinguishable graphitic Raman signature after annealing in air at 500°C compared to the other Si-aC:H films, suggesting a possible relationship between the nature of transfer films resulting from dry sliding in air and the bulk films that were annealed in air.

Duke Scholars

Author Jeffrey Glass Electrical and Computer Engineering