Investigation of the process factor space on bias-enhanced nucleation of diamond on silicon

Journal Article (Journal Article)

The influence of the process parameters on bias-enhanced nucleation of diamond on silicon was studied. When low pressures (< 15 Torr) and/or high bias voltages (more than 350 V d.c.) were used, no significant diamond nucleation was observed; in some cases diamond was found to be removed under these conditions. Low bias voltages (below -150 V d.c.) had very little effect on diamond nucleation, and higher process pressures (> 25 Torr) resulted in poor diamond film uniformities. A well defined process zone was determined in which a short bias duration (< 20 min) may be utilized to obtain enhanced diamond nucleation densities and improved diamond film uniformities. The process factors responsible for these optimum responses were a pressure of ∼20 Torr and a bias voltage of ∼-320 V d.c. using a 5%CH4-H2 gas mixture. © 1995.

Full Text

Duke Authors

Cited Authors

  • Wolter, SD; Glass, JT; Stoner, BR

Published Date

  • June 1, 1995

Published In

Volume / Issue

  • 261 / 1-2

Start / End Page

  • 4 - 11

International Standard Serial Number (ISSN)

  • 0040-6090

Digital Object Identifier (DOI)

  • 10.1016/S0040-6090(94)06432-6

Citation Source

  • Scopus