Effects of applied substrate bias during reactive sputter deposition of nanocomposite tantalum carbide/amorphous hydrocarbon thin films

Nanocomposite tantalum carbide/amorphous hydrocarbon (TaC/a-C:H) thin film composition, structure, and mechanical properties depend on the direct current bias voltage (Vb) level applied to the substrate during reactive sputter deposition. A set of TaC/a-C:H films was deposited across the range Vb = 0 to - 300 V with all other deposition parameters held constant except substrate temperature, which was allowed to reach its steady state during the depositions. Effects of Vb on film composition and structure were explored, including TaC crystallite size and dispersion using X-ray diffraction and high resolution transmission electron microscopy. In addition, the dependency of stress and hardness on Vb was studied with an emphasis on relationships to a-C:H phase structure. © 2006 Elsevier B.V. All rights reserved.

Full Text

Duke Authors

Cited Authors

  • Evans, RD; Doll, GL; Meng, WJ; Mei, F; Glass, JT

Published Date

  • 2007

Published In

Volume / Issue

  • 515 / 13

Start / End Page

  • 5403 - 5410

International Standard Serial Number (ISSN)

  • 0040-6090

Digital Object Identifier (DOI)

  • 10.1016/j.tsf.2006.12.034

Citation Source

  • SciVal