Ultraflat nanosphere lithography: functionalized nanostructures for biomedical applications


Journal Article

A new method, so-called ultraflat nanosphere lithography (UNSL), was designed to create nanopatterned surfaces of minimal topography and defined size for different materials capable of self-assembly chemistry. The feasibility of the method was demonstrated using pairs of materials M1 and M2.

Duke Authors

Cited Authors

  • Frey, W; Chilkoti, A

Published Date

  • December 1, 2000

Published In

Volume / Issue

  • 28 / SUPPL. 1

International Standard Serial Number (ISSN)

  • 0090-6964

Citation Source

  • Scopus