Erratum: Profile estimation of high-concentration arsenic diffusion in silicon (Journal of Applied Physics (1972) 43, (1278))

Journal Article (Journal)

Full Text

Duke Authors

Cited Authors

  • Fair, RB

Published Date

  • December 1, 1973

Published In

Volume / Issue

  • 44 / 1

Start / End Page

  • 536 -

International Standard Serial Number (ISSN)

  • 0021-8979

Digital Object Identifier (DOI)

  • 10.1063/1.1661938

Citation Source

  • Scopus