Compliant substrate strain modulated epitaxy for WDM laser arrays

Journal Article

A new method for making a multiple-wavelength laser array by using strain modulated epitaxy is described. This growth process, which enables growth on a smooth substrate surface while enabling three dimensional band structure engineering, uses a bottom-patterned compliant substrate to modulate the strain variation on the epitaxial layer grown on the compliant substrate. To achieve the strain variation as a function of lateral position on the grown sample, a bottom patterned compliant substrate is used to vary the strain. A mathematical model has been developed for the realization of a multiple wavelength laser array using bottom patterned compliant substrates.

Duke Authors

Cited Authors

  • Shen, JJ; Jokerst, NM; Brown, AS

Published Date

  • December 1, 1998

Published In

Volume / Issue

  • 1 /

Start / End Page

  • 95 - 96

International Standard Serial Number (ISSN)

  • 1092-8081

Citation Source

  • Scopus