Compliant substrate strain modulated epitaxy for WDM laser arrays
A new method for making a multiple-wavelength laser array by using strain modulated epitaxy is described. This growth process, which enables growth on a smooth substrate surface while enabling three dimensional band structure engineering, uses a bottom-patterned compliant substrate to modulate the strain variation on the epitaxial layer grown on the compliant substrate. To achieve the strain variation as a function of lateral position on the grown sample, a bottom patterned compliant substrate is used to vary the strain. A mathematical model has been developed for the realization of a multiple wavelength laser array using bottom patterned compliant substrates.