A versatile diffractive maskless lithography for single-shot and serial microfabrication.

Journal Article (Journal Article)

We demonstrate a diffractive maskless lithographic system that is capable of rapidly performing both serial and single-shot micropatterning. Utilizing the diffractive properties of phase holograms displayed on a spatial light modulator, arbitrary intensity distributions were produced to form two and three dimensional micropatterns/structures in a variety of substrates. A straightforward graphical user interface was implemented to allow users to load templates and change patterning modes within the span of a few minutes. A minimum resolution of approximately 700 nm is demonstrated for both patterning modes, which compares favorably to the 232 nm resolution limit predicted by the Rayleigh criterion. The presented method is rapid and adaptable, allowing for the parallel fabrication of microstructures in photoresist as well as the fabrication of protein microstructures that retain functional activity.

Full Text

Duke Authors

Cited Authors

  • Jenness, NJ; Hill, RT; Hucknall, A; Chilkoti, A; Clark, RL

Published Date

  • May 2010

Published In

Volume / Issue

  • 18 / 11

Start / End Page

  • 11754 - 11762

PubMed ID

  • 20589036

Pubmed Central ID

  • PMC2920747

Electronic International Standard Serial Number (EISSN)

  • 1094-4087

International Standard Serial Number (ISSN)

  • 1094-4087

Digital Object Identifier (DOI)

  • 10.1364/oe.18.011754


  • eng