Epitaxial films of cobalt disilicide (100) evaporated onto Si(100) from a mixed source
Publication
, Journal Article
Goeller, PT; Wang, Z; Sayers, DE; Glass, JT; Nemanich, RJ
Published in: Materials Research Society Symposium - Proceedings
January 1, 1996
Thin films of (100) oriented CoSi2 have been electron beam evaporated onto Si(100) substrates from a mixed Co-Si target. A sharp c(2×2) low energy electron diffraction (LEED) pattern resulted after annealing the films to 800 °C. Extended x-ray absorption fine structure (EXAFS) of the film indicated the phase to be CoSi2. Quantitative x-ray photoelectron spectroscopy (XPS) analysis revealed the surface of the film to be slightly Si rich, indicating the Si terminated CoSi2 variant. Analysis of transmission electron microscope (TEM) diffraction patterns also provided evidence of the (100) orientation of the film.
Duke Scholars
Published In
Materials Research Society Symposium - Proceedings
ISSN
0272-9172
Publication Date
January 1, 1996
Volume
402
Start / End Page
511 / 516
Citation
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Goeller, P. T., Wang, Z., Sayers, D. E., Glass, J. T., & Nemanich, R. J. (1996). Epitaxial films of cobalt disilicide (100) evaporated onto Si(100) from a mixed source. Materials Research Society Symposium - Proceedings, 402, 511–516.
Goeller, P. T., Z. Wang, D. E. Sayers, J. T. Glass, and R. J. Nemanich. “Epitaxial films of cobalt disilicide (100) evaporated onto Si(100) from a mixed source.” Materials Research Society Symposium - Proceedings 402 (January 1, 1996): 511–16.
Goeller PT, Wang Z, Sayers DE, Glass JT, Nemanich RJ. Epitaxial films of cobalt disilicide (100) evaporated onto Si(100) from a mixed source. Materials Research Society Symposium - Proceedings. 1996 Jan 1;402:511–6.
Goeller, P. T., et al. “Epitaxial films of cobalt disilicide (100) evaporated onto Si(100) from a mixed source.” Materials Research Society Symposium - Proceedings, vol. 402, Jan. 1996, pp. 511–16.
Goeller PT, Wang Z, Sayers DE, Glass JT, Nemanich RJ. Epitaxial films of cobalt disilicide (100) evaporated onto Si(100) from a mixed source. Materials Research Society Symposium - Proceedings. 1996 Jan 1;402:511–516.
Published In
Materials Research Society Symposium - Proceedings
ISSN
0272-9172
Publication Date
January 1, 1996
Volume
402
Start / End Page
511 / 516