Electrochemical AFM "Dip-Pen" Nanolithography and More

Published

Journal Article

A general approach for fabricating metallic and semiconducting nanostructures has been developed based on dip-pen nanolithography combined with electrochemical reduction of water-soluble salts. This method can be used to directly write many different types of metal or semiconductor features on Si substrates with sub 50 nanometer linewidth. This simple but powerful method has great potential in fabricating functional nanodevices with high degree of control over their locations and structures.

Duke Authors

Cited Authors

  • Li, Y; Ben, M; Liu, J

Published Date

  • December 1, 2002

Published In

Volume / Issue

  • 18 / 1

International Standard Serial Number (ISSN)

  • 1001-4861

Citation Source

  • Scopus