Grain enhancement of polycrystalline silicon films aided by optical excitation
Publication
, Journal Article
Sopori, BL; Chen, W; Alleman, J; Matson, R; Ravindra, NM; Tan, TY
Published in: Materials Research Society Symposium - Proceedings
January 1, 1998
A new technique for making large-grain thin Si films is described in which optical excitation is used to enhance the grain growth. Grain sizes much larger than the film thickness can be obtained at low temperatures and in short process times. This method is well suited for making thin-film Si solar cells on low-temperature substrates.
Duke Scholars
Published In
Materials Research Society Symposium - Proceedings
ISSN
0272-9172
Publication Date
January 1, 1998
Volume
485
Start / End Page
95 / 100
Citation
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Sopori, B. L., Chen, W., Alleman, J., Matson, R., Ravindra, N. M., & Tan, T. Y. (1998). Grain enhancement of polycrystalline silicon films aided by optical excitation. Materials Research Society Symposium - Proceedings, 485, 95–100.
Sopori, B. L., W. Chen, J. Alleman, R. Matson, N. M. Ravindra, and T. Y. Tan. “Grain enhancement of polycrystalline silicon films aided by optical excitation.” Materials Research Society Symposium - Proceedings 485 (January 1, 1998): 95–100.
Sopori BL, Chen W, Alleman J, Matson R, Ravindra NM, Tan TY. Grain enhancement of polycrystalline silicon films aided by optical excitation. Materials Research Society Symposium - Proceedings. 1998 Jan 1;485:95–100.
Sopori, B. L., et al. “Grain enhancement of polycrystalline silicon films aided by optical excitation.” Materials Research Society Symposium - Proceedings, vol. 485, Jan. 1998, pp. 95–100.
Sopori BL, Chen W, Alleman J, Matson R, Ravindra NM, Tan TY. Grain enhancement of polycrystalline silicon films aided by optical excitation. Materials Research Society Symposium - Proceedings. 1998 Jan 1;485:95–100.
Published In
Materials Research Society Symposium - Proceedings
ISSN
0272-9172
Publication Date
January 1, 1998
Volume
485
Start / End Page
95 / 100