Grain enhancement of polycrystalline silicon films aided by optical excitation

A new technique for making large-grain thin Si films is described in which optical excitation is used to enhance the grain growth. Grain sizes much larger than the film thickness can be obtained at low temperatures and in short process times. This method is well suited for making thin-film Si solar cells on low-temperature substrates.

Duke Authors

Cited Authors

  • Sopori, BL; Chen, W; Alleman, J; Matson, R; Ravindra, NM; Tan, TY

Published Date

  • 1998

Published In

  • Materials Research Society Symposium - Proceedings

Volume / Issue

  • 485 /

Start / End Page

  • 95 - 100

Citation Source

  • SciVal