Chapter 9 Mechanisms of Oxygen Precipitation: Some Quantitative Aspects
Publication
, Journal Article
Tan, TY; Taylor, WJ
Published in: Semiconductors and Semimetals
January 1, 1994
Duke Scholars
Published In
Semiconductors and Semimetals
DOI
ISSN
0080-8784
Publication Date
January 1, 1994
Volume
42
Issue
C
Start / End Page
353 / 390
Citation
APA
Chicago
ICMJE
MLA
NLM
Tan, T. Y., & Taylor, W. J. (1994). Chapter 9 Mechanisms of Oxygen Precipitation: Some Quantitative Aspects. Semiconductors and Semimetals, 42(C), 353–390. https://doi.org/10.1016/S0080-8784(08)60252-5
Tan, T. Y., and W. J. Taylor. “Chapter 9 Mechanisms of Oxygen Precipitation: Some Quantitative Aspects.” Semiconductors and Semimetals 42, no. C (January 1, 1994): 353–90. https://doi.org/10.1016/S0080-8784(08)60252-5.
Tan TY, Taylor WJ. Chapter 9 Mechanisms of Oxygen Precipitation: Some Quantitative Aspects. Semiconductors and Semimetals. 1994 Jan 1;42(C):353–90.
Tan, T. Y., and W. J. Taylor. “Chapter 9 Mechanisms of Oxygen Precipitation: Some Quantitative Aspects.” Semiconductors and Semimetals, vol. 42, no. C, Jan. 1994, pp. 353–90. Scopus, doi:10.1016/S0080-8784(08)60252-5.
Tan TY, Taylor WJ. Chapter 9 Mechanisms of Oxygen Precipitation: Some Quantitative Aspects. Semiconductors and Semimetals. 1994 Jan 1;42(C):353–390.
Published In
Semiconductors and Semimetals
DOI
ISSN
0080-8784
Publication Date
January 1, 1994
Volume
42
Issue
C
Start / End Page
353 / 390