Ferrofluid masking for lithographic applications

Published

Journal Article

A novel self-aligned "soft masking" method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultra-fine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic field bias applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV or chemical exposure.

Duke Authors

Cited Authors

  • Yellen, B; Friedman, G

Published Date

  • November 2, 2004

Published In

  • 2004 Nsti Nanotechnology Conference and Trade Show Nsti Nanotech 2004

Volume / Issue

  • 1 /

Start / End Page

  • 451 - 454

Citation Source

  • Scopus