ON THE ROLE OF ION-IMPLANTATION DAMAGE IN SILICON ON DOPANT DIFFUSION FOR SHALLOW JUNCTION FORMATION
Journal Article (Journal)
Full Text
Duke Authors
Cited Authors
- KIM, Y; FAIR, RB; MASSOUD, HZ
Published Date
- July 1, 1988
Published In
Volume / Issue
- 17 / 4
Start / End Page
- S26 - S26
Published By
Pages
- 1
International Standard Serial Number (ISSN)
- 0361-5235
Language
- English