ON THE ROLE OF ION-IMPLANTATION DAMAGE IN SILICON ON DOPANT DIFFUSION FOR SHALLOW JUNCTION FORMATION

Published

Journal Article

Full Text

Duke Authors

Cited Authors

  • KIM, Y; FAIR, RB; MASSOUD, HZ

Published Date

  • July 1, 1988

Published In

Volume / Issue

  • 17 / 4

Start / End Page

  • S26 - S26

Published By

Pages

  • 1

International Standard Serial Number (ISSN)

  • 0361-5235

Language

  • English