TRANSIENT DIFFUSION IN SILICON - MODELS AND CURES
Publication
, Conference
FAIR, RB
Published in: JOURNAL OF ELECTRONIC MATERIALS
July 1, 1990
Duke Scholars
Published In
JOURNAL OF ELECTRONIC MATERIALS
ISSN
0361-5235
Publication Date
July 1, 1990
Volume
19
Issue
7
Start / End Page
34 / 34
Publisher
MINERALS METALS MATERIALS SOC
Related Subject Headings
- Applied Physics
- 51 Physical sciences
- 40 Engineering
- 34 Chemical sciences
- 1099 Other Technology
- 0906 Electrical and Electronic Engineering
- 0202 Atomic, Molecular, Nuclear, Particle and Plasma Physics
Citation
APA
Chicago
ICMJE
MLA
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FAIR, R. B. (1990). TRANSIENT DIFFUSION IN SILICON - MODELS AND CURES. In JOURNAL OF ELECTRONIC MATERIALS (Vol. 19, pp. 34–34). MINERALS METALS MATERIALS SOC.
FAIR, R. B. “TRANSIENT DIFFUSION IN SILICON - MODELS AND CURES.” In JOURNAL OF ELECTRONIC MATERIALS, 19:34–34. MINERALS METALS MATERIALS SOC, 1990.
FAIR RB. TRANSIENT DIFFUSION IN SILICON - MODELS AND CURES. In: JOURNAL OF ELECTRONIC MATERIALS. MINERALS METALS MATERIALS SOC; 1990. p. 34–34.
FAIR, R. B. “TRANSIENT DIFFUSION IN SILICON - MODELS AND CURES.” JOURNAL OF ELECTRONIC MATERIALS, vol. 19, no. 7, MINERALS METALS MATERIALS SOC, 1990, pp. 34–34.
FAIR RB. TRANSIENT DIFFUSION IN SILICON - MODELS AND CURES. JOURNAL OF ELECTRONIC MATERIALS. MINERALS METALS MATERIALS SOC; 1990. p. 34–34.
Published In
JOURNAL OF ELECTRONIC MATERIALS
ISSN
0361-5235
Publication Date
July 1, 1990
Volume
19
Issue
7
Start / End Page
34 / 34
Publisher
MINERALS METALS MATERIALS SOC
Related Subject Headings
- Applied Physics
- 51 Physical sciences
- 40 Engineering
- 34 Chemical sciences
- 1099 Other Technology
- 0906 Electrical and Electronic Engineering
- 0202 Atomic, Molecular, Nuclear, Particle and Plasma Physics