Wear-out and stress-induced leakage current of ultrathin gate oxides

Conference Paper

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Duke Authors

Massoud, Hisham Z.

Cited Authors

Thees, HJ; Osburn, CM; Shiely, JP; Massoud, HZ

Published Date

1996

Published In

Physics and Chemistry of Sio(2) and the Si Sio(2) Interface 3, 1996

Volume / Issue

96 / 1

Start / End Page

677 - 686

International Standard Book Number 10 (ISBN-10)

1-56677-151-X