Electrical performance of stacked high-k gate dielectrics: Remote plasma CVD Ta2O5 and (Ta2O5)(x)(SiO2)(1-x) alloys with ultrathin plasma processed SiO2 interface layers

Conference Paper

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Duke Authors

Massoud, Hisham Z.

Cited Authors

Niimi, H; Johnson, RS; Lucovsky, G; Massoud, HZ

Published Date

2000

Published In

Physics and Chemistry of Sio2 and the Si Sio2 Interface 4

Volume / Issue

2000 / 2

Start / End Page

487 - 494

International Standard Book Number 10 (ISBN-10)

1-56677-267-2