MINERALS, METALS & MATERIALS SOC
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Publisher Of
- ON THE ROLE OF ION-IMPLANTATION DAMAGE IN SILICON ON DOPANT DIFFUSION FOR SHALLOW JUNCTION FORMATION. Journal of Electronic Materials. 17:S26-S26. 1988
- FOAMED ULTRALIGHT REACTIVE METALS - POTENTIAL USE IN LARGE-SCALE SPACE ENGINEERING. Journal of Metals. 37:A114-A114. 1985
- Entropy of the gamma-alpha martensitic transformation in Fe71Ni29. 75-80. 2005
- Rapid thermal annealing issues in silicon processing. 61-66. 1996
- TRANSIENT DIFFUSION IN SILICON - MODELS AND CURES. Journal of Electronic Materials. 34-34. 1990
- MICROSTRUCTURE OF SPUTTERED SUPERCONDUCTING FILMS OF BI2SR2CACU2OX MADE BY LOW-TEMPERATURE, INSITU GROWTH. 329-339. 1990