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Evaluation of field-effect mobility and contact resistance of transistors that use solution-processed single-walled carbon nanotubes

Publication ,  Journal Article
Cao, Q; Han, SJ; Tulevski, GS; Franklin, AD; Haensch, W
Published in: ACS Nano
July 24, 2012

Solution-processed single-walled carbon nanotubes (SWNTs) offer many unique processing advantages over nanotubes grown by the chemical vapor deposition (CVD) method, including capabilities of separating the nanotubes by electronic type and depositing them onto various substrates in the form of ultradensely aligned arrays at low temperature. However, long-channel transistors that use solution-processed SWNTs generally demonstrate inferior device performance, which poses concerns over the feasibility of using these nanotubes in high-performance logic applications. This paper presents the first systematic study of contact resistance, intrinsic field-effect mobility (μ FE), and conductivity (μ m) of solution-processed SWNTs based on both the transmission line method and the Y function method. The results indicate that, compared to CVD nanotubes, although solution-processed SWNTs have much lower μ FE for semiconducting nanotubes and lower μ m for metallic nanotubes due to the presence of a higher level of structural defects, such defects do not affect the quality of electric contacts between the nanotube and metal source/drain electrodes. Therefore, solution-processed SWNTs are expected to offer performance comparable to that of CVD nanotubes in ultimately scaled field-effect transistors, where contacts will dominate electron transport instead of electron scattering in the channel region. These results show promise for using solution-processed SWNTs for high-performance nanoelectronic devices. © 2012 American Chemical Society.

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Published In

ACS Nano

DOI

EISSN

1936-086X

ISSN

1936-0851

Publication Date

July 24, 2012

Volume

6

Issue

7

Start / End Page

6471 / 6477

Related Subject Headings

  • Nanoscience & Nanotechnology
 

Citation

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Cao, Q., Han, S. J., Tulevski, G. S., Franklin, A. D., & Haensch, W. (2012). Evaluation of field-effect mobility and contact resistance of transistors that use solution-processed single-walled carbon nanotubes. ACS Nano, 6(7), 6471–6477. https://doi.org/10.1021/nn302185d
Cao, Q., S. J. Han, G. S. Tulevski, A. D. Franklin, and W. Haensch. “Evaluation of field-effect mobility and contact resistance of transistors that use solution-processed single-walled carbon nanotubes.” ACS Nano 6, no. 7 (July 24, 2012): 6471–77. https://doi.org/10.1021/nn302185d.
Cao Q, Han SJ, Tulevski GS, Franklin AD, Haensch W. Evaluation of field-effect mobility and contact resistance of transistors that use solution-processed single-walled carbon nanotubes. ACS Nano. 2012 Jul 24;6(7):6471–7.
Cao, Q., et al. “Evaluation of field-effect mobility and contact resistance of transistors that use solution-processed single-walled carbon nanotubes.” ACS Nano, vol. 6, no. 7, July 2012, pp. 6471–77. Scopus, doi:10.1021/nn302185d.
Cao Q, Han SJ, Tulevski GS, Franklin AD, Haensch W. Evaluation of field-effect mobility and contact resistance of transistors that use solution-processed single-walled carbon nanotubes. ACS Nano. 2012 Jul 24;6(7):6471–6477.
Journal cover image

Published In

ACS Nano

DOI

EISSN

1936-086X

ISSN

1936-0851

Publication Date

July 24, 2012

Volume

6

Issue

7

Start / End Page

6471 / 6477

Related Subject Headings

  • Nanoscience & Nanotechnology