Comparison of external and internal planar radio frequency antennae for inductively coupled plasma

Radio frequency (rf) antennae, coated with glass, were inductively coupled to an Ar plasma inside the processing chamber. Coupling efficiency η and electron density Ne were measured for moderate pressures (0.1-200 T) and rf power (10-2000 W). Decreasing the dielectric thickness between the antenna and the Ar led to an increase in η and a decrease in Ne. Instabilities and hysteresis were observed for the internal antennae. © 1997 American Institute of Physics.

Duke Scholars

Author Brian R. Stoner Electrical and Computer Engineering