Effect of deposition interruption and substrate bias on the structure of sputter-deposited yttria-stabilized zirconia thin films
Publication
, Journal Article
Ruddell, DE; Stoner, BR; Thompson, JY
Published in: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
September 1, 2002
The effect of deposition interruption and substrate bias on the structure of sputter-deposited yttria-stabilized zirconia thin films was discussed. The use of a periodic substrate bias was found to produce a laminate structure with alternating layers of distinctly different microstructure. The analysis showed that as the thickness of the layer decreased (with increasing number of layers), the monoclinic phase was eliminated from the deposited thin films.
Duke Scholars
Published In
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
DOI
ISSN
0734-2101
Publication Date
September 1, 2002
Volume
20
Issue
5
Start / End Page
1744 / 1748
Related Subject Headings
- Applied Physics
- 51 Physical sciences
- 40 Engineering
- 09 Engineering
- 02 Physical Sciences
Citation
APA
Chicago
ICMJE
MLA
NLM
Ruddell, D. E., Stoner, B. R., & Thompson, J. Y. (2002). Effect of deposition interruption and substrate bias on the structure of sputter-deposited yttria-stabilized zirconia thin films. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 20(5), 1744–1748. https://doi.org/10.1116/1.1501573
Ruddell, D. E., B. R. Stoner, and J. Y. Thompson. “Effect of deposition interruption and substrate bias on the structure of sputter-deposited yttria-stabilized zirconia thin films.” Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 20, no. 5 (September 1, 2002): 1744–48. https://doi.org/10.1116/1.1501573.
Ruddell DE, Stoner BR, Thompson JY. Effect of deposition interruption and substrate bias on the structure of sputter-deposited yttria-stabilized zirconia thin films. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2002 Sep 1;20(5):1744–8.
Ruddell, D. E., et al. “Effect of deposition interruption and substrate bias on the structure of sputter-deposited yttria-stabilized zirconia thin films.” Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 20, no. 5, Sept. 2002, pp. 1744–48. Scopus, doi:10.1116/1.1501573.
Ruddell DE, Stoner BR, Thompson JY. Effect of deposition interruption and substrate bias on the structure of sputter-deposited yttria-stabilized zirconia thin films. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2002 Sep 1;20(5):1744–1748.
Published In
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
DOI
ISSN
0734-2101
Publication Date
September 1, 2002
Volume
20
Issue
5
Start / End Page
1744 / 1748
Related Subject Headings
- Applied Physics
- 51 Physical sciences
- 40 Engineering
- 09 Engineering
- 02 Physical Sciences