Plano-eucentric photometry system for micro-display metrology
Publication
, Conference
Lamvik, M; Grego, S
Published in: Digest of Technical Papers - SID International Symposium
December 1, 2005
We describe a unique micro-display metrology system in which the stage can be rotated arbitrarily and the area of interest does not leave the field of view. Similarly, the sample can be tilted up to 60 degrees and the area of interest stays continuously in focus. The mechanism operates instantaneously and does not depend on computers or motors to achieve correct centering. This capability facilitates the rapid measurement of micro-display characteristics over a wide range of angles. © 2005 SID.
Duke Scholars
Published In
Digest of Technical Papers - SID International Symposium
DOI
ISSN
0097-966X
Publication Date
December 1, 2005
Volume
36
Issue
1
Start / End Page
542 / 545
Citation
APA
Chicago
ICMJE
MLA
NLM
Lamvik, M., & Grego, S. (2005). Plano-eucentric photometry system for micro-display metrology. In Digest of Technical Papers - SID International Symposium (Vol. 36, pp. 542–545). https://doi.org/10.1889/1.2036495
Lamvik, M., and S. Grego. “Plano-eucentric photometry system for micro-display metrology.” In Digest of Technical Papers - SID International Symposium, 36:542–45, 2005. https://doi.org/10.1889/1.2036495.
Lamvik M, Grego S. Plano-eucentric photometry system for micro-display metrology. In: Digest of Technical Papers - SID International Symposium. 2005. p. 542–5.
Lamvik, M., and S. Grego. “Plano-eucentric photometry system for micro-display metrology.” Digest of Technical Papers - SID International Symposium, vol. 36, no. 1, 2005, pp. 542–45. Scopus, doi:10.1889/1.2036495.
Lamvik M, Grego S. Plano-eucentric photometry system for micro-display metrology. Digest of Technical Papers - SID International Symposium. 2005. p. 542–545.
Published In
Digest of Technical Papers - SID International Symposium
DOI
ISSN
0097-966X
Publication Date
December 1, 2005
Volume
36
Issue
1
Start / End Page
542 / 545