Skip to main content
Journal cover image

Temperature-induced chaos during nanorod growth by physical vapor deposition

Publication ,  Journal Article
Mukherjee, S; Zhou, CM; Gall, D
Published in: Journal of Applied Physics
June 22, 2009

Atomic shadowing during kinetically limited physical vapor deposition causes a chaotic instability in the layer morphology that leads to nanorod growth. Glancing angle deposition (GLAD) experiments indicate that the rod morphology, in turn, exhibits a chaotic instability with increasing surface diffusion. The measured rod width versus growth temperature converges onto a single curve for all metals when normalized by the melting point Tm. A model based on mean field nucleation theory reveals a transition from a two- to three-dimensional growth regime at (0.20±0.03) × Tm and an activation energy for diffusion on curved surfaces of (2.46±0.02) ×k Tm. The consistency in the GLAD data suggests that the effective mass transport on a curved surface is described by a single normalized activation energy that is applicable to all elemental metals. © 2009 American Institute of Physics.

Duke Scholars

Published In

Journal of Applied Physics

DOI

ISSN

0021-8979

Publication Date

June 22, 2009

Volume

105

Issue

9

Related Subject Headings

  • Applied Physics
  • 09 Engineering
  • 02 Physical Sciences
  • 01 Mathematical Sciences
 

Citation

APA
Chicago
ICMJE
MLA
NLM
Mukherjee, S., Zhou, C. M., & Gall, D. (2009). Temperature-induced chaos during nanorod growth by physical vapor deposition. Journal of Applied Physics, 105(9). https://doi.org/10.1063/1.3116720
Mukherjee, S., C. M. Zhou, and D. Gall. “Temperature-induced chaos during nanorod growth by physical vapor deposition.” Journal of Applied Physics 105, no. 9 (June 22, 2009). https://doi.org/10.1063/1.3116720.
Mukherjee S, Zhou CM, Gall D. Temperature-induced chaos during nanorod growth by physical vapor deposition. Journal of Applied Physics. 2009 Jun 22;105(9).
Mukherjee, S., et al. “Temperature-induced chaos during nanorod growth by physical vapor deposition.” Journal of Applied Physics, vol. 105, no. 9, June 2009. Scopus, doi:10.1063/1.3116720.
Mukherjee S, Zhou CM, Gall D. Temperature-induced chaos during nanorod growth by physical vapor deposition. Journal of Applied Physics. 2009 Jun 22;105(9).
Journal cover image

Published In

Journal of Applied Physics

DOI

ISSN

0021-8979

Publication Date

June 22, 2009

Volume

105

Issue

9

Related Subject Headings

  • Applied Physics
  • 09 Engineering
  • 02 Physical Sciences
  • 01 Mathematical Sciences