Radiation-Induced Modifications of Various Polyorganophosphazenes for Assessing Their Potential as Resists for Semiconductor Microlithography
Publication
, Thesis Dissertation
Grune, G
1992
Duke Scholars
Publication Date
1992
Citation
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Grune, G. (1992). Radiation-Induced Modifications of Various Polyorganophosphazenes for Assessing Their Potential as Resists for Semiconductor Microlithography. (V. Stannett, Ed.).
Grune, Guerry. “Radiation-Induced Modifications of Various Polyorganophosphazenes for Assessing Their Potential as Resists for Semiconductor Microlithography.” Edited by Vivian Stannett, 1992.
Grune G. Radiation-Induced Modifications of Various Polyorganophosphazenes for Assessing Their Potential as Resists for Semiconductor Microlithography. Stannett V, editor. 1992.
Grune, Guerry. Radiation-Induced Modifications of Various Polyorganophosphazenes for Assessing Their Potential as Resists for Semiconductor Microlithography. Edited by Vivian Stannett, 1992.
Grune G. Radiation-Induced Modifications of Various Polyorganophosphazenes for Assessing Their Potential as Resists for Semiconductor Microlithography. Stannett V, editor. 1992.
Publication Date
1992