Skip to main content

RTD/CMOS Nanoelectronic Circuits: Thin-Film InP-Based Resonant Tunneling Diodes Integrated with CMOS Circuits

Publication ,  Journal Article
Bergman, JI; Chang, J; Joo, Y; Matinpour, B; Laskar, J; Jokerst, NM; Brooke, MA; Brar, B; Beam, E
Published in: IEEE Electron Device Letters
March 1, 1999

The combination of resonant tunneling diodes (RTD's) and complementary metal-oxide-semiconductor (CMOS) silicon circuitry can offer substantial improvement in speed, power dissipation, and circuit complexity over CMOS-only circuits. We demonstrate the first integrated resonant tunneling CMOS circuit, a clocked 1-bit comparator with a device count of six, compared with 21 in a comparable all-CMOS design. A hybrid integration process is developed for InP-based RTD's which are transferred and bonded to CMOS chips. The prototype comparator shows sensitivity in excess of 106 V/A, and achieves error-free performance in functionality testing. An optimized integration process, under development, can yield high-speed, low power circuits by lowering the high parasitic capacitance associated with the prototype circuit.

Duke Scholars

Published In

IEEE Electron Device Letters

DOI

ISSN

0741-3106

Publication Date

March 1, 1999

Volume

20

Issue

3

Start / End Page

119 / 122

Related Subject Headings

  • Applied Physics
  • 4009 Electronics, sensors and digital hardware
  • 0906 Electrical and Electronic Engineering
 

Citation

APA
Chicago
ICMJE
MLA
NLM
Bergman, J. I., Chang, J., Joo, Y., Matinpour, B., Laskar, J., Jokerst, N. M., … Beam, E. (1999). RTD/CMOS Nanoelectronic Circuits: Thin-Film InP-Based Resonant Tunneling Diodes Integrated with CMOS Circuits. IEEE Electron Device Letters, 20(3), 119–122. https://doi.org/10.1109/55.748907
Bergman, J. I., J. Chang, Y. Joo, B. Matinpour, J. Laskar, N. M. Jokerst, M. A. Brooke, B. Brar, and E. Beam. “RTD/CMOS Nanoelectronic Circuits: Thin-Film InP-Based Resonant Tunneling Diodes Integrated with CMOS Circuits.” IEEE Electron Device Letters 20, no. 3 (March 1, 1999): 119–22. https://doi.org/10.1109/55.748907.
Bergman JI, Chang J, Joo Y, Matinpour B, Laskar J, Jokerst NM, et al. RTD/CMOS Nanoelectronic Circuits: Thin-Film InP-Based Resonant Tunneling Diodes Integrated with CMOS Circuits. IEEE Electron Device Letters. 1999 Mar 1;20(3):119–22.
Bergman, J. I., et al. “RTD/CMOS Nanoelectronic Circuits: Thin-Film InP-Based Resonant Tunneling Diodes Integrated with CMOS Circuits.” IEEE Electron Device Letters, vol. 20, no. 3, Mar. 1999, pp. 119–22. Scopus, doi:10.1109/55.748907.
Bergman JI, Chang J, Joo Y, Matinpour B, Laskar J, Jokerst NM, Brooke MA, Brar B, Beam E. RTD/CMOS Nanoelectronic Circuits: Thin-Film InP-Based Resonant Tunneling Diodes Integrated with CMOS Circuits. IEEE Electron Device Letters. 1999 Mar 1;20(3):119–122.

Published In

IEEE Electron Device Letters

DOI

ISSN

0741-3106

Publication Date

March 1, 1999

Volume

20

Issue

3

Start / End Page

119 / 122

Related Subject Headings

  • Applied Physics
  • 4009 Electronics, sensors and digital hardware
  • 0906 Electrical and Electronic Engineering