Skip to main content

RTD/CMOS Nanoelectronic Circuits: Thin-Film InP-Based Resonant Tunneling Diodes Integrated with CMOS Circuits

Publication ,  Journal Article
Bergman, JI; Chang, J; Joo, Y; Matinpour, B; Laskar, J; Jokerst, NM; Brooke, MA; Brar, B; Beam, E
Published in: IEEE Electron Device Letters
March 1, 1999

The combination of resonant tunneling diodes (RTD's) and complementary metal-oxide-semiconductor (CMOS) silicon circuitry can offer substantial improvement in speed, power dissipation, and circuit complexity over CMOS-only circuits. We demonstrate the first integrated resonant tunneling CMOS circuit, a clocked 1-bit comparator with a device count of six, compared with 21 in a comparable all-CMOS design. A hybrid integration process is developed for InP-based RTD's which are transferred and bonded to CMOS chips. The prototype comparator shows sensitivity in excess of 106 V/A, and achieves error-free performance in functionality testing. An optimized integration process, under development, can yield high-speed, low power circuits by lowering the high parasitic capacitance associated with the prototype circuit.

Duke Scholars

Altmetric Attention Stats
Dimensions Citation Stats

Published In

IEEE Electron Device Letters

DOI

ISSN

0741-3106

Publication Date

March 1, 1999

Volume

20

Issue

3

Start / End Page

119 / 122

Related Subject Headings

  • Applied Physics
  • 4009 Electronics, sensors and digital hardware
  • 0906 Electrical and Electronic Engineering
 

Citation

APA
Chicago
ICMJE
MLA
NLM
Bergman, J. I., Chang, J., Joo, Y., Matinpour, B., Laskar, J., Jokerst, N. M., … Beam, E. (1999). RTD/CMOS Nanoelectronic Circuits: Thin-Film InP-Based Resonant Tunneling Diodes Integrated with CMOS Circuits. IEEE Electron Device Letters, 20(3), 119–122. https://doi.org/10.1109/55.748907
Bergman, J. I., J. Chang, Y. Joo, B. Matinpour, J. Laskar, N. M. Jokerst, M. A. Brooke, B. Brar, and E. Beam. “RTD/CMOS Nanoelectronic Circuits: Thin-Film InP-Based Resonant Tunneling Diodes Integrated with CMOS Circuits.” IEEE Electron Device Letters 20, no. 3 (March 1, 1999): 119–22. https://doi.org/10.1109/55.748907.
Bergman JI, Chang J, Joo Y, Matinpour B, Laskar J, Jokerst NM, et al. RTD/CMOS Nanoelectronic Circuits: Thin-Film InP-Based Resonant Tunneling Diodes Integrated with CMOS Circuits. IEEE Electron Device Letters. 1999 Mar 1;20(3):119–22.
Bergman, J. I., et al. “RTD/CMOS Nanoelectronic Circuits: Thin-Film InP-Based Resonant Tunneling Diodes Integrated with CMOS Circuits.” IEEE Electron Device Letters, vol. 20, no. 3, Mar. 1999, pp. 119–22. Scopus, doi:10.1109/55.748907.
Bergman JI, Chang J, Joo Y, Matinpour B, Laskar J, Jokerst NM, Brooke MA, Brar B, Beam E. RTD/CMOS Nanoelectronic Circuits: Thin-Film InP-Based Resonant Tunneling Diodes Integrated with CMOS Circuits. IEEE Electron Device Letters. 1999 Mar 1;20(3):119–122.

Published In

IEEE Electron Device Letters

DOI

ISSN

0741-3106

Publication Date

March 1, 1999

Volume

20

Issue

3

Start / End Page

119 / 122

Related Subject Headings

  • Applied Physics
  • 4009 Electronics, sensors and digital hardware
  • 0906 Electrical and Electronic Engineering