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A Three-Dimensional High-Throughput Architecture Using Through-Wafer Optical Interconnect

Publication ,  Journal Article
Wills, DS; Lacy, WS; Camperi-Ginestet, C; Buchanan, B; Cat, HH; Wilkinson, S; Lee, M; Jokerst, NM; Brooke, MA
Published in: Journal of Lightwave Technology
January 1, 1995

This paper presents a three-dimensional, highly parallel, optically interconnected system to process high-throughput stream data such as images. The vertical optical interconnections are realized using integrated optoelectronic devices operating at wavelengths to which silicon is transparent. These through-wafer optical signals are used to vertically optically interconnect stacked silicon circuits. The thin film optoelectronic devices are bonded directly to the stacked layers of silicon circuitry to realize self-contained vertical optical interconnections. Each integrated circuit layer contains analog interface circuitry, namely, detector amplifier and emitter driver circuitry, and digital circuitry for the network and/or processor, all of which are fabricated using a standard silicon integrated circuit foundry. These silicon circuits are post processed to integrate the thin film optoelectronics using standard, low cost, high yield microfabrication techniques. The three-dimensionally integrated architectures described herein are a network and a processor. The network has been designed to meet off-chip I/O using a new offset cube topology coupled with naming and routing schemes. The performance of this network is comparable to that of a three-dimensional mesh. The processing architecture has been defined to minimize overhead for basic parallel operations. The system goal for this research is to develop an integrated processing node for high-throughput, low-memory applications. © 1995 IEEE

Duke Scholars

Published In

Journal of Lightwave Technology

DOI

EISSN

1558-2213

ISSN

0733-8724

Publication Date

January 1, 1995

Volume

13

Issue

6

Start / End Page

1085 / 1092

Related Subject Headings

  • Optoelectronics & Photonics
  • 5102 Atomic, molecular and optical physics
  • 4008 Electrical engineering
  • 4006 Communications engineering
  • 1005 Communications Technologies
  • 0906 Electrical and Electronic Engineering
  • 0205 Optical Physics
 

Citation

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Wills, D. S., Lacy, W. S., Camperi-Ginestet, C., Buchanan, B., Cat, H. H., Wilkinson, S., … Brooke, M. A. (1995). A Three-Dimensional High-Throughput Architecture Using Through-Wafer Optical Interconnect. Journal of Lightwave Technology, 13(6), 1085–1092. https://doi.org/10.1109/50.390224
Wills, D. S., W. S. Lacy, C. Camperi-Ginestet, B. Buchanan, H. H. Cat, S. Wilkinson, M. Lee, N. M. Jokerst, and M. A. Brooke. “A Three-Dimensional High-Throughput Architecture Using Through-Wafer Optical Interconnect.” Journal of Lightwave Technology 13, no. 6 (January 1, 1995): 1085–92. https://doi.org/10.1109/50.390224.
Wills DS, Lacy WS, Camperi-Ginestet C, Buchanan B, Cat HH, Wilkinson S, et al. A Three-Dimensional High-Throughput Architecture Using Through-Wafer Optical Interconnect. Journal of Lightwave Technology. 1995 Jan 1;13(6):1085–92.
Wills, D. S., et al. “A Three-Dimensional High-Throughput Architecture Using Through-Wafer Optical Interconnect.” Journal of Lightwave Technology, vol. 13, no. 6, Jan. 1995, pp. 1085–92. Scopus, doi:10.1109/50.390224.
Wills DS, Lacy WS, Camperi-Ginestet C, Buchanan B, Cat HH, Wilkinson S, Lee M, Jokerst NM, Brooke MA. A Three-Dimensional High-Throughput Architecture Using Through-Wafer Optical Interconnect. Journal of Lightwave Technology. 1995 Jan 1;13(6):1085–1092.
Journal cover image

Published In

Journal of Lightwave Technology

DOI

EISSN

1558-2213

ISSN

0733-8724

Publication Date

January 1, 1995

Volume

13

Issue

6

Start / End Page

1085 / 1092

Related Subject Headings

  • Optoelectronics & Photonics
  • 5102 Atomic, molecular and optical physics
  • 4008 Electrical engineering
  • 4006 Communications engineering
  • 1005 Communications Technologies
  • 0906 Electrical and Electronic Engineering
  • 0205 Optical Physics